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The plasma generated by plasma focus (PF) devices have substantially different physical characteristics from another plasma, energetic ions and electrons, compared with conventional plasma devices used for plasma nanofabrication, offering new and unique opportunities in the processing and synthes...


Inestrosa-Izurieta, M.J.Moreno, J.Davis, S.Soto, L.[Ti film deposition process of a plasma focus: Study by an experimental design]Ti film deposition process of a plasma focus: Study by an experimental design

Present work is aimed to perform dosimetric measurements to characterize dosis obtained from pulsed x-rays emitted from a hundred joules plasma focus device PF-400J using thermoluminescent dosimeters (TLD-100). Two dosimeter arrays (containing 21 dosimeters in each) were used. One of the arrays w...

The work is supported by grant ACT-1115, CONICYT, Chile.


Jain, J.Moreno, J.Avila, R.E.Avaria, G.Pavez, C.Bora, B.Davis, S.Soto, L.[Pulsed x-rays dose measurements from a hundred joules plasma focus device]Pulsed x-rays dose measurements from a hundred joules plasma focus device

The Plasma Focus (PF) is a kind of dense transient plasmas in with high-pulsed voltage. To produce devices for eld application it is necessary to obtain PF equipment able to operate for a long period of time. Thus, a reliability analysis is indispensable. In this work a reliability analysis progr...

The work is supported by IAEA CRP contract 20370 and by grant ACT-1115, CONICYT, Chile.


Zanelli, D.López, E.Pavez, C.Pedreros, J.Jain, J.Avaria, G.Moreno, J.Bora, B.Davis, S.Soto, L.[Analysis of Deterioration in a Plasma Focus Device]Analysis of Deterioration in a Plasma Focus Device

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