The plasma generated by plasma focus (PF) devices have substantially different physical characteristics from another plasma, energetic ions and electrons, compared with conventional plasma devices used for plasma nanofabrication, offering new and unique opportunities in the processing and synthes...
Enlace original:
http://repositorio.unab.cl/xmlui/handle/ria/5689
Inestrosa-Izurieta, M.J.
,
Moreno, J.
,
Davis, S.
,
Soto, L.
,
[Ti film deposition process of a plasma focus: Study by an experimental design]
,
Ti film deposition process of a plasma focus: Study by an experimental design
